Silicon Precursors

Silicon Precursors Help Optimize CVD and ALD

Silicon-containing materials are used throughout semiconductor device manufacturing. DuPont is a longtime provider of silicon gas/precursors for the chemical vapor deposition (CVD) and atomic layer deposition (ALD) steps in chipmaking.

These proven solutions have been widely adopted throughout the semiconductor industry, with DuPont delivering a safe, stable supply and quality management of these advanced materials.

DuPont’s offerings include:

• Trimethysilane (3MS) gas for low-K dielectric and low-K diffusion barriers with copper interconnects, as well as etch hard masks

• Tetramethylsilane (4MS) precursors for low-K barrier films; etch hard masks; and carbon-doped silicon films and silicon carbide-like films

• Hexachlorodisilane (HCDS) precursors for conformal silicon oxide and silicon nitride applications throughout the ALD process. Available in both chemical and electronic grade products.

• DuPont – your partner for quality silicon-based precursor materials.