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AR™ 10L Bottom Anti-Reflectant Coating
AR™ 10L is an organic, thermally cross-linking bottom anti-reflectant coating (BARC) for 248 nm (KrF) photoresists. It is designed to provide a universal anti-reflective surface for high- and low-temperature resist platforms and offers excellent compatibility with most ESCAP HYBRID and Acetal resists. AR™ 10L is a conformal 1st min., 248 nm anti-reflectant and is typically used in the range of 400-1200A over transparent thin films on reflective substrates.
Features
- Approximate optical density=9abs/um
- Conformal coating
- Universal resist compatibility
- 1st min film thickness=600A over reflective dielectrics
- Compatible with common spin-coating and EBR solvents
- Fast etching rate, typically 30-40% faster than DUV series photoresists
150 nm 1:1 Lines/Spaces
Figure 1: 410 nm UV135 on 60 nm AR™ 10L Fast Etch
150 nm Isolated Line
Figure 2: 398 nm SL4000 on 60 nm AR™ 10L Fast Etch
190 nm 1:1 Lines/Spaces
Figure 3: 520 nm UVN30 on 60 nm AR™ 10L Fast Etch
170 nm 1:1 Lines/Spaces
Figure 4: AR™ 10L Fast Etch Reflectivity Curve