CMP Pads

Politex™ CMP Polishing Pads

 
 
 

Politex™ CMP Polishing Pads

The Politex™ pad series for chemical mechanical planarization (CMP) is used for Copper barrier, buffing and cleaning applications. Politex™ pads are the industry standard soft pad.

  • Benefits:

    • Industry standard soft pad for multiple applications
    • Requires no conditioning

    Applications:

    • Copper barrier, buff

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