MICROFILL™ LVF 3 ACID COPPER

MICROFILL™ LVF 3 ACID COPPER

Solutions
  • High Density Interconnect
 
 
 

Features & benefits

  • Bright, highly ductile, leveled deposit
  • DC process with insoluble anodes for simple operation
  • Designed for use in both pattern and panel plate applications
  • Easily analyzed and controlled by conventional CVS
  • Excellent blind microvia fill with lower copper surface thickness
  • Tunable process for specific end user requirements
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