CMP Pads

IC1000™ CMP Polishing Pads

 
 
 

IC1000™ CMP Polishing Pads

The IC1000™ series of pads for chemical mechanical planarization (CMP) is the industry standard. DuPont’s IC1000™ pads are used in a wide variety of CMP applications today. While the IC1000™ formulation has remained constant, the quality and consistency of the product offerings have been improved continuously for over 20 years. Popular pads in this family include the IC1000™ CMP pad and the IC1010™ CMP pad.

  • Benefits:

    • Industry standard hard pad for multiple applications
    • World-class quality and performance consistency

    Applications:

    • Copper bulk, Tungsten, STI/Ceria, Oxide, Buff

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